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Journal
1. H. H, Park, J. S. Lee, S. Nahm, and Y. H. Lee "Investication on the
interfacial reaction of SiO2/Ti0.1W0.9 system "
Journal of non-crystalline solids, vol. 187, pp.149-155, 1995.
2. J.S. Lee, Y.H.Lee, "Metal-to-metal antifuse with amorphous Ti-rich
barium titanate film and silicon oxide film," Solid-State Electronics,
vol. 42, no. 3, pp.469-472, 1999.
3. S.H. Kim, J.S. Lee, H.C.Choi, and Y.H. Lee "The fabrication of thin-film
bulk acoustic wave resonators employing a ZnO/Si composite diaphragm structure
using porous silicon layer etching," IEEE Electron Device Letters, vol.
20, no. 3, pp. 113-115, 1999.
4. J.S. Lee, H.S. Park " Low voltage coefficient double polysilicon
capacitors using thin dielectric for analog circuit applications," Journal
of the Korean Physical Society, vol. 34, pp. 330-333, 1999.
5. J.S. Lee, Y.H. Bae, and Y.H.Lee " A novel Batio3/SiO2-based voltage-programmable
link applicable to on-chip programmable devices," Semiconductor Science
and Technology, vol.15, no.3, pp.267-269, 2000.
6. J. S. Lee and Y. H. Lee " Analytical model and characteristics of
abnormally structured MOSFETs,"¡¡ IEEE Trans. on Electron Devices, 2000,
vol. 47, no. 12, pp. 2352-2357.
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